Lian-Ying Ma

Xi'an Institute of Technology, Ch’ang-an, Shaanxi, China

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Publications (9)5.79 Total impact

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    ABSTRACT: The output energy stability of discharged-pumped pulsed HF laser in repetition rate mode is studied experimentally, and the optimal operating conditions are obtained. The experimental results show that the output energy decreases quickly with the increase of repetition rate, and increasing gas flow rate is beneficial to improve the discharge stability and the output energy stability as well. By optimizing the operating conditions, the laser can operate stably at the repetition rate of 50 Hz, with the stable output energy of about 260 mJ, and the average power is about 13 W.
    Proceedings of SPIE - The International Society for Optical Engineering 01/2012; 8677:09-. DOI:10.1117/12.2010558 · 0.20 Impact Factor
  • Chao Huang · Jing-ru Liu · Li Yu · Ying Tang · Xiao-xia An · Ai-ping Yi · Feng Zhu · Ke Huang · Lian-ying Ma ·
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    ABSTRACT: Surface discharge Radiation Source has been used as optical pumping source of XeF(C-A) gaseous laser. In previous works, discharge deposition power, transition efficiency and UV radiation intensity of surface discharge Radiation Source were mostly concerned, but the jitter of repetitively pulsed surface discharge was little studied. An optical pumping source by segmented surface discharge on Al2O3 ceramic substrate is developed to design stable XeF(C-A) laser with pulse repetitive mode. Distorted electric field near the surfaces of the ceramic substrate is calculated based on equivalent chain circuit model under conditions of charging voltage from 0 to 26.8kV, thickness of the substrate from 1mm to 3mm, and trigger pulse voltage from 47kV to 63kV. Analysis about trigger characteristics of pumping source is carried out, and influence of these conditions on discharge jitter is discussed. And discharge jitter is investigated in detail under different conditions. The experimental results show that discharge jitter decreases with increasing charging voltage and trigger pulse voltage, as well as decreasing thickness of ceramic substrate, and the pulse repetition rate has little influence on the discharge jitter in the range of 1Hz to 30Hz. These experimental results are coincident with numerical simulation results. Normally, the discharge jitter can be less than 30ns. Research results indicate that the optical pumping source has good time stability of repetitive pulse discharge.
    Proceedings of SPIE - The International Society for Optical Engineering 01/2012; 8677. DOI:10.1117/12.2010619 · 0.20 Impact Factor
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    ABSTRACT: The method of the spectral narrowing of optically pumped XeF(C-A) laser is discussed. Two experimental schemes are used to narrow the spectrum of XeF(C-A) laser. Linewidth less than 1 nm can be obtained normally and the minimum linewidth is up to 0.2 nm with more than 2J output energy. Broadband tunability of the XeF(C-A) laser in the spectral range from 448 to 520nm is accomplished. The results of spectral narrowing of XeF(C-A) laser with different experimental schemes are compared and tunable spectra of the XeF(C-A) laser are given.
    Proceedings of SPIE - The International Society for Optical Engineering 09/2010; 7751. DOI:10.1117/12.879444 · 0.20 Impact Factor
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    ABSTRACT: The experimental setup and performance of a non-chain transverse excited HF laser with UV pre-ionization is described. Electric discharge characteristics in gas mixture of SF6 /C2H6 are investigated for various initial conditions by recording the discharge plasma fluorescence intensity and temporal evolution of discharge current and voltage. The laser pulse energy is studied in different charging voltage, gas mixture pressure and concentration. It is shown that the process of discharge in gas mixture has three phases: glow discharge, voltage plateau and arc discharge. The optimal energy deposition obtained at the critical point that the voltage plateau just disappears. Maximal output energy of 0.6J and electrical efficiency of 2.5% are obtained.
    Proceedings of SPIE - The International Society for Optical Engineering 09/2010; 7751:30-. DOI:10.1117/12.879212 · 0.20 Impact Factor
  • Li Yu · Xiao-Xia An · Lian-Ying Ma · Ai-Ping Yi · Feng Zhu · Chao Huang · Jing-Ru Liu ·
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    ABSTRACT: In this paper, a surface discharge optical pumping source module with high repetition mode is described. The electrical and radiative properties of the optical pumping source have been studied. The equivalent resistance and inductance, the maximum current and the deposition efficiency of the discharge circuit under various distances of electrodes have been compared. The framing photographs of XeF2 photodissociation wave have been obtained which show the XeF laser can be formed under the experimental condition. The repetition characteristics of the optical pumping source have been experimentally studied. The maximum pulse repetition rate is up to 90 Hz. The ablation of the dielectric material surface is considered.
    Proceedings of SPIE - The International Society for Optical Engineering 01/2008; 7131. DOI:10.1117/12.816110 · 0.20 Impact Factor
  • Li Yu · Jing-ru Liu · Lian-ying Ma · Ai-ping Yi · Chao Huang · Xiao-xia An · Hui Li · Guang-yu Chen ·
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    ABSTRACT: An optically pumped XeF(C-A) laser with 0.1-1 Hz pulse-repetition mode is demonstrated. The maximum output energy is up to 18.7 J, which corresponds to the conversion efficiency of the stored electrical energy to laser output energy of 0.25%. The laser active medium is optically excited by vacuum-ultraviolet radiation of two single-channel surface discharges initiated along opposite walls of the laser cell. The laser resonator output coupling is 10%, and the initial XeF2 concentration in the active gas mixture is ~1 x 10(17) cm(-3). The duration of the observed laser pulses is 0.8 to 1.2 micros, and the spectral band is 470-500 nm.
    Optics Letters 06/2007; 32(9):1087-9. DOI:10.1364/OL.32.001087 · 3.29 Impact Factor
  • Li Yu · Jing-ru Liu · Ai-ping Yi · Lian-ying Ma · Chao Huang · Xiao-xia An ·
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    ABSTRACT: Taking advantage of the framing camera, the performances of the laser pumping source were studied. The framing photographs of XeF2 photodissociation wave (PDW) under different experimental conditions had been taken, which showed the forming process of the PDW. The variations of the radius, thickness and developing velocity of the PDW with time had been obtained under different XeF2 initial concentrations. The temporal and spatial characteristics of the PDW had been analyzed. The irradiative intensity of pumping source could be diagnosed by calculating the time evolution of XeF2 photodissociation wave which was photographed by framing camera. The framing photographs of the discharge plasma channel under different conditions had been obtained. The effect of the discharge plasma extension on the efficiency resistance of the discharge circuit had been analyzed.
    Proceedings of SPIE - The International Society for Optical Engineering 01/2007; 6279. DOI:10.1117/12.725252 · 0.20 Impact Factor
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    ABSTRACT: A joule level of XeF(C-A) laser optically pumped by a sectioned surface discharge was developed. The irradiative intensity of pumping source was diagnosed by calculating XeF2 photo-dissociation wave evolvement which was photographed by a framing camera. The photon flux in the wavelength region of 140 to 170nm is about 5 × 1023 photon s2, that corresponds to the irradiative brightness temperature of more than 25000 K. The laser experiments were carried out in different conditions. The maximum laser output energy of 2.5 J was obtained with the total conversion efficiency of 0.1%.
    Laser and Particle Beams 10/2005; 23(04). DOI:10.1017/S0263034605050755 · 1.30 Impact Factor
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    ABSTRACT: XeF(C-A) laser has been attracted attention nearly several years due to its higher saturable energy density (50 mJ/cm2), 70∼80 nm broad gain bandwidth centered near 480 nm2 (corresponds to the bandwidth of a transform-limited pulse of 10 fs duration), scalability to high energy, and a low level of the amplified spontaneous emission. XeF(C-A) laser can become one of the most suitable amplifier for a high-power femtosecond laser system.