Karina Barnholt Klepper

Publications (3)11.51 Total impact

• Article: Atomic layer deposition of organic-inorganic hybrid materials based on saturated linear carboxylic acids.

  Karina Barnholt Klepper, Ola Nilsen, Per-Anders Hansen, Helmer Fjellvåg
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  ABSTRACT: Atomic layer deposition (ALD) has successfully provided thin films of organic-inorganic hybrid materials based on saturated linear carboxylic acids and trimethylaluminium (TMA). Films were grown for seven carboxylic acids: oxalic, malonic, succinic, glutaric, pimelic, suberic and sebacic acid, i.e. ranging from 2 to 10 carbon atoms in the molecular structure. These processes show exceptionally high growth rates; up to 4.3 nm/cycle for the pimelic acid-TMA system. Quartz crystal microbalance measurements of the growth dynamics indicate that all systems are of a self limiting ALD-type. Nevertheless, temperature dependent growth was observed in several systems. The width of the ALD windows shows correlations with the length of the carbon chains. Fourier transform infrared spectroscopy clearly proved that the deposited films are of a hybrid character, where the carboxylic acids primarily form bidentate complexes, though bridging complexes may also form. All films are X-ray amorphous as deposited. The films were further analyzed by atomic force microscopy for surface roughness and topography, UV-Vis spectroscopy and ellipsometry for optical properties, and the goniometer method for measuring sessile drops for surface wetting properties. Apart from the oxalic and malonic acid-TMA systems, the films are stable in contact with water. The films are generally smooth, transparent and have a refractive index close to 1.5. The complete coverage and accurate growth control offered by the ALD technique is here proven to provide surface-functionalized hybrid materials resembling metal-organic frameworks (MOF), probably as rather dense structures, yet with substantial potential for applications.
  Dalton Transactions 03/2011; 40(17):4636-46. · 3.84 Impact Factor
• Article: Deposition of thin films of organic-inorganic hybrid materials based on aromatic carboxylic acids by atomic layer deposition.

  Karina Barnholt Klepper, Ola Nilsen, Helmer Fjellvåg
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  ABSTRACT: Thin films of organic-inorganic hybrid materials have been grown by the atomic layer deposition (ALD) technique, using trimethylaluminium (TMA) and aromatic carboxylic acids such as 1,2-benzene dicarboxylic acid, 1,3-benzene dicarboxylic acid, 1,4-benzene dicarboxylic acid, 1,3,5-benzene tricarboxylic acid, 1,2,4,5-benzene tetracarboxylic acid as precursors. Growth rates as function of temperature show that all systems, with the exception of the benzoic acid-TMA system, possess ALD-windows and provides growth rates in the range of 0.25-1.34 nm/cycle. X-ray diffraction studies of the as-deposited films reveal their amorphous character, which is also supported by very low surface roughness as measured by atomic force microscopy. As-deposited films were investigated by Fourier Transform Infrared Spectroscopy proving that the deposited films are of a hybrid character.
  Dalton Transactions 11/2010; 39(48):11628-35. · 3.84 Impact Factor
• Article: Growth of iron cobalt oxides by atomic layer deposition.

  Martin Lie, Karina Barnholt Klepper, Ola Nilsen, Helmer Fjellvåg, Arne Kjekshus
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  ABSTRACT: Thin films of iron cobalt oxides with spinel-type structure are made by the atomic layer deposition (ALD) technique using Fe(thd)3 (Hthd = 2,2,6,6-tetramethylheptane-3,5-dione), Co(thd)2, and ozone as precursors. Pulse parameters for ALD-type growth are established and such growth can be achieved at deposition temperatures between 185 and 310 degrees C. Films have been deposited on amorphous soda-lime glass and single-crystalline substrates of Si(100), MgO(100), and alpha-Al2O3(001) which all provide crystalline films, but with various orientations and crystallite sizes. Application of an external magnetic field during the film growth does not influence film growth characteristics (growth rate, crystallinity, topography etc.). Magnetization data are reported for phase-pure films of spinel-type structure with composition Fe2CoO4.
  Dalton Transactions 02/2008; · 3.84 Impact Factor