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Thierry Deschamps,
Antoine Guille,
Emmanuel Drouard,
Radoslaw Mazurczyk,
Régis Orobtchouk,
Cecile Jamois, Alain Fave,
Romain Peretti,
Erwann Fourmond,
Antonio Pereira,
Bernard Moine,
Christian Seassal
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ABSTRACT: In silicon-based solar cells, a substantial part of the energy losses is related to the charge carriers thermalization in the UV-blue range and the week carriers collection at these wavelenghts. To avoid this issue, we introduce a new concept which combines a rare-earths doped thin layer with a photonic crystal (PC) layer, allowing an efficient conversion from UV-blue photons to near-IR photons. We report on the feasibility of such a nanostructured down-converter module using an active rare-earth doped CaYAlO4 thin layer and a silicon nitride PC on top. By means of optical numerical simulations, the promising potentialities of the concept are demonstrated. © (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Proc SPIE 03/2013;
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ABSTRACT: In this paper, we present the integration of combined front and back 1D and 2D diffraction gratings with different periods, within thin film photovoltaic solar cells based on crystalline silicon layers. The grating structures have been designed considering both the need for incident light absorption enhancement and the technological feasibility. Long wavelength absorption is increased thanks to the long period (750 nm) back grating, while the incident light reflection is reduced by using a short period (250 nm) front grating. The simulated short circuit current in a solar cell combining a front and a back grating structures with a 1.2 µm thick c-Si layer, together with the back electrode and TCO layers, is increased up to 30.3 mA/cm2, compared to 18.4 mA/cm2 for a reference stack, as simulated using the AM1.5G solar spectrum intensity distribution from 300 nm to 1100 nm, and under normal incidence.
Optics Express 07/2012; 20(S5):A560-A571. · 3.59 Impact Factor
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Xianqin Meng,
Valérie Depauw,
Guillaume Gomard,
Ounsi El Daif,
Christos Trompoukis,
Emmanuel Drouard,
Cécile Jamois, Alain Fave,
Frédéric Dross,
Ivan Gordon,
Christian Seassal
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ABSTRACT: In this paper, we present the integration of an absorbing photonic crystal within a monocrystalline silicon thin film photovoltaic stack fabricated without epitaxy. Finite difference time domain optical simulations are performed in order to design one- and two-dimensional photonic crystals to assist crystalline silicon solar cells. The simulations show that the 1D and 2D patterned solar cell stacks would have an increased integrated absorption in the crystalline silicon layer would increase of respectively 38% and 50%, when compared to a similar but unpatterned stack, in the whole wavelength range between 300 nm and 1100 nm. In order to fabricate such patterned stacks, we developed an effective set of processes based on laser holographic lithography, reactive ion etching and inductively coupled plasma etching. Optical measurements performed on the patterned stacks highlight the significant absorption increase achieved in the whole wavelength range of interest, as expected by simulation. Moreover, we show that with this design, the angle of incidence has almost no influence on the absorption for angles as high as around 60°.
Optics Express 07/2012; 20 Suppl 4:A465-75. · 3.59 Impact Factor
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ABSTRACT: In this paper we discuss on light management in silicon thin film solar cells, using photonic crystal (PhC) structures. We particularly focus on photovoltaic devices including amorphous silicon absorbers patterned as 2D PhCs. Physical principles and design rules leading to the optimized configuration of the patterned cell are discussed by means of optical simulations performed on realistic thin film solar cell stacks. Theoretically, a maximum increase of 40%rel in integrated absorption in the a-Si:H layer of the patterned cell is expected compared to the unpatterned case. Moreover, both simulation and optical characterization of the fabricated cells demonstrate the robustness of their optical properties with regard to the angle of incidence of the light and to the fabrication induced defects in the PhCs. Finally, the impact of surface recombination due to the generation of new free surfaces with higher defect densities is addressed. We demonstrate that patterning still induces a substantial increase in the conversion efficiency, with a reasonable surface recombination velocity.
Journal of Optics 01/2012; 14(14):024011.
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Xianqin Meng,
Guillaume Gomard,
Ounsi EI Daif,
Emmanuel Drouard,
Regis Orobtchouka,
Anne Kaminskia, Alain Fave,
Mustapha Lemitia,
Alexei Abramovd,
Pere Roca i Cabarrocasd,
Christian Seassal
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ABSTRACT: In this paper, we present the integration of an absorbing photonic crystal within a thin-film photovoltaic solar cell. Optical simulations performed on a complete solar cell revealed that patterning the hydrogenated amorphous silicon active layer as a 2D photonic crystal membrane enabled to increase its integrated absorption by 28 % between 300 and 720 nm, comparing to a similar but unpatterned stack. In order to fabricate such promising cells, we developed a high throughput process based on holographic lithography and reactive ion etching. The influences of the parameters taking part in those processes on the obtained patterns are discussed. Optical measurements performed on the resulting “photonized” solar cell structures underline the regularity of the 2D pattern and a significant absorption increase above 550 nm, similarly to what is observed on the simulated absorption spectra. Moreover, our patterned cells are found to be robust with regards to the angle of incidence of the light.
Solar Energy Materials and Solar Cells. 05/2011; 95:S32–S38.
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Ounsi El Daif,
Emmanuel Drouard,
Guillaume Gomard,
Anne Kaminski, Alain Fave,
Mustapha Lemiti,
Sungmo Ahn,
Sihan Kim,
Pere Roca I Cabarrocas,
Heonsu Jeon,
Christian Seassal
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ABSTRACT: We report on the absorption of a 100nm thick hydrogenated amorphous silicon layer patterned as a planar photonic crystal (PPC), using laser holography and reactive ion etching. Compared to an unpatterned layer, electromagnetic simulation and optical measurements both show a 50% increase of the absorption over the 0.38-0.75micron spectral range, in the case of a one-dimensional PPC. Such absorbing photonic crystals, combined with transparent and conductive layers, may be at the basis of new photovoltaic solar cells.
Optics Express 09/2010; 18 Suppl 3:A293-9. · 3.59 Impact Factor
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ABSTRACT: We propose a design that increases significantly the absorption of a thin layer of absorbing material such as amorphous silicon. This is achieved by patterning a one-dimensional photonic crystal (1DPC) in this layer. Indeed, by coupling the incident light into slow Bloch modes of the 1DPC, we can control the photon lifetime and then, enhance the absorption integrated over the whole solar spectrum. Optimal parameters of the 1DPC maximize the integrated absorption in the wavelength range of interest, up to 45% in both S and P polarization states instead of 33% for the unpatterned, 100 nm thick amorphous silicon layer. Moreover, the absorption is tolerant with respect to fabrication errors, and remains relatively stable if the angle of incidence is changed.
Optics Express 09/2009; 17(16):14312-21. · 3.59 Impact Factor
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Ounsi El Daif,
Emmanuel Drouard,
Yeonsang Park, Alain Fave,
Anne Kaminski,
Mustapha Lemiti,
Xavier Letartre,
Pierre Viktorovitch,
Sungmo Ahn,
Heonsu Jeon,
Christian Seassal
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ABSTRACT: We report on very high enhancement of thin layer's absorption through band-engineering of a photonic crystal structure. We realized amorphous silicon (aSi) photonic crystals, where slow light modes improve absorption efficiency. We show through simulation that an increase of the absorption by a factor of 1.5 is expected for a film of aSi. The proposal is then validated by an experimental demonstration, showing an important increase of the absorption of a layer of aSi over a spectral range of 0.32-0.76 microns. Comment: 4 pages, 5 figures
05/2009;
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Proc. of 23rd European PVSC; 09/2008
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Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series; 01/2008
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ABSTRACT: This work intends to investigate the effectiveness of silicon nitride layers (SiNx : H) deposited by photochemical vapor deposition (UVCVD) for antireflection and passivation purposes when applied to electromagnetically casted silicon solar cells (EMC). Effective reflectivity of 10.8% is achieved, as well as 66% increase of minority carrier lifetime.
Solar Energy Materials and Solar Cells. 01/2001; 65(1-4):297-301.
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Tech. Digest of 11th PVSEC; 01/1999
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Xianqin Meng,
Guillaume Gomard,
Ounsi El Daif,
Emmanuel Drouard,
Regis Orobtchouk,
Anne Kaminski, Alain Fave,
Mustapha Lemiti,
Alexei Abramov,
Pere Roca i Cabarrocas,
Christian Seassal
[show abstract]
[hide abstract]
ABSTRACT: In this paper, we present the integration of an absorbing photonic crystal within a thin-film photovoltaic solar cell. Optical simulations performed on a complete solar cell revealed that patterning the hydrogenated amorphous silicon active layer as a 2D photonic crystal membrane enabled to increase its integrated absorption by 28 % between 300 and 720 nm, comparing to a similar but unpatterned stack. In order to fabricate such promising cells, we developed a high throughput process based on holographic lithography and reactive ion etching. The influences of the parameters taking part in those processes on the obtained patterns are discussed. Optical measurements performed on the resulting “photonized” solar cell structures underline the regularity of the 2D pattern and a significant absorption increase above 550 nm, similarly to what is observed on the simulated absorption spectra. Moreover, our patterned cells are found to be robust with regards to the angle of incidence of the light.Graphical Abstract
Solar Energy Materials and Solar Cells 95. · 4.54 Impact Factor
