M.D. Arnold

Publications (4)0 Total impact

• Source

  Available from: ac.nz

  Conference Proceeding: Analysis and comparison of simulation techniques for silver superlenses

  C.P. Moore, M.D. Arnold, P.J. Bones, R.J. Blaikie
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  ABSTRACT: Transfer-matrix and finite element modelling techniques were used to simulate single- and multi-layer silver-based superlenses. The techniques were compared for their abilities to simulate sub- diffraction-limited resolution and DC transmission. The finite element modelling technique confirmed conclusions drawn from T-matrix analysis, namely that multi-layer superlenses had greater transmission over a larger window of spatial frequencies than single-layer superlenses and that superlens performance was adversely affected by resonances at different frequencies. The failure of the T-matrix technique to model interactions between the mask and lens was identified as one of the main sources of inaccuracy; however, the technique remained valuable due to its superior computational efficiency compared to finite element modelling.
  Nanoscience and Nanotechnology, 2008. ICONN 2008. International Conference on; 03/2008
• Source

  Available from: canterbury.ac.nz

  Article: Analysis and Comparison of Simulation Techniques for Silver Superlenses

  C.P. Moore, M.D. Arnold, P.J. Bones, R.J. Blaikie
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  ABSTRACT: 210-213 Transfer-matrix and finite element modelling techniques were used to simulate single- and multi-layer silver-based superlenses. The techniques were compared for their abilities to simulate sub-diffraction-limited resolution and DC transmission. The finite element modelling technique confirmed conclusions drawn from T-matrix analysis, namely that multi-layer superlenses had greater transmission over a larger window of spatial frequencies than single-layer superlenses and that superlens performance was adversely affected by resonances at different frequencies. The failure of the T-matrix technique to model interactions between the mask and lens was identified as one of the main sources of inaccuracy; however, the technique remained valuable due to its superior computational efficiency compared to finite element modelling.
  http://dx.doi.org/10.1109/ICONN.2008.4639284.
• Source

  Available from: canterbury.ac.nz

  Article: Using surface-plasmon effects to improve process latitute in near-field optical lithography

  M.D. Arnold, R.J. Blaikie
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  ABSTRACT: ©2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. Surface Plasmon Enhanced Contact Lithography uses an underlying plasmonic layer to enhance image quality in Evanescent Near-Field Optical Lithography. This article details simulations aimed at finding optimum conditions and attempts to explain some underlying mechanisms. Parameters explored include resist thickness, metal permittivity and thickness, polarization, and grating period and duty-cycle.
  http://dx.doi.org/10.1109/ICONN.2006.340675.
• Source

  Available from: canterbury.ac.nz

  Article: Fabrication and characterisation of solid-state electrochemical switches

  J.E. Foulkes, M.D. Arnold, R.J. Blaikie
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  ABSTRACT: Solid-state electrochemical switches, also known as Quantised Conductance Atomic Switches (QCAS), have been investigated using reversible conversion of silver to silver sulphide for the switching. Electron-beam lithography and a custom plasma-based sulphidation technique have been employed for device fabrication, and optical ellipsometry has been used to accurately characterise the sulphidation reaction. The sulphide layer that is formed saturates at a thickness of 10-12 nm, which is ideal for these devices. Prototype devices, fabricated using nichrome as the inert electrode, have an OFF/ON resistance ratio of 1000, with an on-state resistance of 90 Ω.