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ABSTRACT: A novel technique for linearizing photonic links employing Mach-Zehnder modulators is presented. A truncated Fourier series representation of a linear transfer function is used to determine the modulator drive voltages V and the optical power levels to be applied to a dual parallel modulator configuration. Simulation results are used to compare the dynamic range performance of the dual modulator configuration with a standard single modulator photonic link. The dual modulator configuration shows that improvements in compressive and spurious-free dynamic range can be achieved over the single modulator configuration, and that it is possible to further optimize the parameters to yield a significant improvement in spurious-free dynamic range without degrading the 1 dB compression point or the compressive dynamic range.
Microwave Conference, 2007. APMC 2007. Asia-Pacific; 01/2008
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ABSTRACT: We report a novel technique for micro texturing of LiNbO<sub>3</sub>. Well-defined raised ridges and etched trenches are demonstrated. This technique is suitable for the realization of surface relief gratings and photonic crystals.
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on; 06/2007
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ABSTRACT: A nano-imprinting technique for fabricating polymer planar waveguide Bragg gratings is presented. The Bragg grating pattern was formed on a photoresist layer by the interference of two laser beams directed at specific angles on this layer. A mould of this grating pattern was taken on Poly Di-methyl-siloxane (PDMS) polymer. A UV15 polymer cladding was then spincoated onto a Si substrate. The Bragg gratings were then imprinted onto the surface of UV15 cladding layer. The waveguide was formed using another polymer (NOA73). A rib waveguide structure was employed for lateral confinement and was also fabricated using soft imprinting. Details of fabrication techniques and optical characterisation are presented.
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ABSTRACT: We present evidence of etching LiNbO3 when annealing two wafers in contact with an intermediate Ti strip. Etched features are characterized qualitatively using atomic force microscopy. The impact of the Ti strip thickness on the depth and roughness of the etched surface is quantified. Etched trenches of similar depths to the original Ti film are achieved with very smooth etched surface.
