C.Y. Yuan

Publications (3)0 Total impact

• Conference Proceeding: Embedded temporal difference in Life Cycle Assessment: Case study on VW Golf A4 CAR

  C.Y. Yuan, R. Simon, N. Mady, D. Dornfeld
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  ABSTRACT: Existing Life Cycle Assessment does not take into account the relative temporal differences in inventory data. The lack of such considerations could lead to an inaccurate analysis of impacts and to incorrect conclusions in the comparative studies of products with comparable inventories but different life cycle times. In this paper, we report on our research of the investigation of the embedded temporal differences in LCA, and propose a simple method to calculate the temporal space of the subject system for life cycle assessment. A case study is performed on VW golf A4 car based on previous LCA results. The temporal space of the vehicle, as estimated, is found to be approximately 11.04 years. We establish the emission pattern of CO₂ along the time scale to demonstrate the effects of product life cycle durations on the LCA modeling and the inventory results. The life cycle inventory flow is discounted using a traditional economic discounting method with two discounting rates, 5% and 10%, respectively. The discounted results indicate that significant differences could be achieved on the life cycle inventory results.
  Sustainable Systems and Technology, 2009. ISSST '09. IEEE International Symposium on; 06/2009
• Source

  Available from: D.A. Dornfeld

  Conference Proceeding: Environmental performance characterization of atomic layer deposition

  C.Y. Yuan, D. Dornfeld
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  ABSTRACT: Atomic layer deposition (ALD) is emerging as a promising nanotechnology for manufacturing dielectrics and insulators on microelectronics devices. Its environmental performance has to be characterized at this early development stage to achieve sustainable manufacturing in the future. In this paper, we report our environmental performance characterization studies on ALD technology through material flow analysis and energy flow analysis. The assessed ALD process is for deposition of Al₂O₃ high-k dielectric films on a 4 inch silicon wafer. The results show that only 50.4% of input trimethyl aluminum (TMA) material is turned into Al₂O₃ film, while the other half is transformed into toxic emissions into the environment. Material usage efficiency of water is only 2.03% in current ALD processes. ALD is also featured with intensive energy consumption. For the studied ALD process, a total of 4.09 MJ energy is consumed for deposition of a 30 nm Al₂O₃ film, with averaged energy consumption at 13.6 KJ per cycle.
  Electronics and the Environment, 2008. ISEE 2008. IEEE International Symposium on; 06/2008
• Conference Proceeding: Manufacturability and sustainability analysis of nano-scale manufacturing

  C.Y. Yuan, D. Dornfeld
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  ABSTRACT: In this project, atomic layer deposition (ALD) of Al₂O₃ high-k dielectric films on silicon wafers is studied as a model process of nanotechnology. The ALD process uses trimethyl aluminum as the metal source and water as the oxidant.
  Electronics and the Environment, 2008. ISEE 2008. IEEE International Symposium on; 06/2008