M. Bakeri-Kassem

Publications (2)0 Total impact

• Source

  Available from: arxiv.org

  Article: Integrated RF MEMS/CMOS Devices

  R.R. Mansour, S. Fouladi, M. Bakeri-Kassem
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  ABSTRACT: A maskless post-processing technique for CMOS chips is developed that enables the fabrication of RF MEMS parallel-plate capacitors with a high quality factor and a very compact size. Simulations and measured results are presented for several MEMS/CMOS capacitors. A 2-pole coupled line tunable bandpass filter with a center frequency of 9.5 GHz is designed, fabricated and tested. A tuning range of 17% is achieved using integrated variable MEMS/CMOS capacitors with a quality factor exceeding 20. The tunable filter occupies a chip area of 1.2 x 2.1 mm2.
  06/2008;
• Conference Proceeding: Integrated RF MEMS/CMOS devices

  R.R. Mansour, S. Fouladi, M. Bakeri-Kassem
  [show abstract] [hide abstract]
  ABSTRACT: A maskless post-processing technique for CMOS chips is developed that enables the fabrication of RF MEMS parallel-plate capacitors with a high quality factor and a very compact size. Simulations and measured results are presented for several MEMS/CMOS capacitors. A 2-pole coupled line tunable bandpass filter with a center frequency of 9.5 GHz is designed, fabricated and tested. A tuning range of 17% is achieved using integrated variable MEMS/CMOS capacitors with a quality factor exceeding 20. The tunable filter occupies a chip area of 1.2 times 2.1 mm².
  Design, Test, Integration and Packaging of MEMS/MOEMS, 2008. MEMS/MOEMS 2008. Symposium on; 05/2008