Publications (2)0 Total impact
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ABSTRACT: Polymeric materials such as polycarbonate (PC) and poly-methyl methacryate (PMMA) are replacing silicon as the major substrate in microfluidic system fabrication due to their outstanding features such as low cost and good chemical resistance. In this study, chemical mechanical polishing (CMP) of PC and PMMA substrates was investigated. Four types of slurry were tested on CMP of the polymers under the same process conditions. The slurry suitable for polishing PC and PMMA was then chosen, and further CMP experiments were carried out under different process conditions. Experimental results showed that increasing table speed or head load increased the material removal rates of the polymers. The polymeric surface quality after CMP was acceptable to most MEMS applications. Analysis of variance was also carried out, and it was found that the interaction of head load and table speed had a significant (95% confidence) effect on surface finish of polished PMMA. On the other hand, table speed had a highly significant (99% confidence) effect on surface finish of polished PC.Microelectronics Journal. 01/2006; 37:295-301.
Conference Paper: CMP of PC, PMMA and SU-8 Polymers[Show abstract] [Hide abstract]
ABSTRACT: Polymers such as PC (polycarbonate), PMMA (poly methyl methacryate) and SU-8 epoxy resin are replacing silicon as the major substrate in microfluidic system (or BioMEMS) fabrication. Chemical mechanical polishing (CMP) is an important technology for many advanced microelectromechanical system (MEMS) and micro-optoelectromechanical system applications. In this study, CMP of PC, PMMA and SU-8 polymers was investigated. Four types of slurry were tested for CMP of PC and PMMA. Experiments were then designed and performed to investigate effects of two key process parameters. The experimental results show that an increase in head load or table speed would cause an increase in material removal rates (MRRs). Within the chosen experimental parameter ranges, the variation of table speed introduced a more significant change in MRRs than that of head load. ANOVA was also carried out, and it was found that the interaction of head load and table speed had a significant (95% confidence) effect on surface finish of polished PMMA samples while table speed had a significant effect on surface finish of polished PC samples. CMP is also a process well suited for polishing high-aspect-ratio SU-8 structures. Polished PC, PMMA and SU-8 surfaces had nanometer-order surface roughness, acceptable to most MEMS applications.Polymers and Adhesives in Microelectronics and Photonics, Polytronic, 2005. Polytronic 2005. 5th International Conference on; 11/2005
Nanyang Technological University
- School of Mechanical and Aerospace Engineering (MAE)