Local surface charges direct the deposition of carbon nanotubes and fullerenes into nanoscale patterns.
ABSTRACT This article reports on the directed deposition of carbon nanotubes (CNTs) and fullerenes onto solid surfaces using local electrostatic fields. Arbitrary patterns of local surface charges are created by charge writing with an atomic force microscope. During the subsequent development of the sample in an aqueous suspension containing surfactant-stabilized CNTs or fullerenes, Coulomb attraction guides the positioning and alignment of these particles onto the charge patterns. The surface potential of the charge patterns provides a direct control over the particle attachment. CNTs and fullerenes precisely reproduce the charge patterns, yielding structures with a lateral resolution down to the particle diameter.
- SourceAvailable from: Eugenio CoronadoAdvanced Materials 02/2010; 22(5):588-91. · 14.83 Impact Factor
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ABSTRACT: Nanoindentation is the leading technique for evaluating nanoscale mechanical properties of materials. Consistent developments in instrumentation and their capabilities are transforming nanoindentation into a powerful tool for characterization of multifunctionality at the nanoscale. This review outlines the integration of nanoindentation with real-time electron imaging, high temperature measurements, electrical characterization, and a combination of these. In situ nanoindentation measurements have enabled the real-time study of the interplay between mechanical, thermal, and electrical effects at the nanoscale. This review identifies previous reviews in this area, traces developments and pinpoints significant recent advances (post-2007), with emphasis on the applications of in situ nanoindentation techniques to materials systems, and highlighting the new insights gained from these in situ techniques. Based on this review, future directions and applications of in situ nanoindentation are identified, which highlight the potential of this suite of techniques for materials scientists from all disciplines.Progress in Materials Science 01/2013; 58(1):1-29. · 23.19 Impact Factor
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ABSTRACT: Artificial nanostructures (Samuelson et al., Physica E 21:560–567, 2004; Xia et al., Adv Mater 15:353–389, 2003) show promise for the organization of functional materials (Huck and Samuelson, Nanotechnology 14:NIL_5–NIL_8, 2003) to create nanoelectronic (Mizuta and Oda, Science 279:208–211, 2008) or nano-optical devices (Mazur et al.; Tanemura et al., Synthesis, Optical Properties and Functional Applications of ZnO Nano-materials: A Review, 1–3:58–63, 2008). However, in most manufacturing recipes described so far, nanostructures are synthesized in solution and/or uncontrolled deposition results in random arrangements; this makes it difficult to measure the properties of attached nanodevices or to integrate them with conventionally fabricated microcircuitry. Here, we describe a fully CMOS compatible process technology for mass manufacture of polysilicon nanowires by the CVD (chemical vapor deposition) method. The large scale production of nanowires could successfully be synthesized on silicon (100) substrates. However, the method presented here can successfully be employed with all technologically useful substrates with good adhesion for silicon such as SiO2, diamond-like carbon or III–V semiconductors. This opens up the possibility for the fabrication of strain-sensitive and defect-sensitive optoelectronic devices on the optimum III–V substrate (Fonstad et al.). Finally, scanning electron microscopy (SEM) was used to characterize the as-synthesized nanowires and energy-filtered transmission electron microscopy (EFTEM) and scanning transmission electron microscopy (STEM) analysis were used to determine the nanowire composition. KeywordsNanowires–Large scale synthesis–Silicon–Nanotechnology–NanomanufacturingJournal of Nanoparticle Research 04/2012; 13(4):1737-1745. · 2.18 Impact Factor