Development of a mass-producible on-chip plasmonic nanohole array biosensor.

Institute of Materials Science, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, 305-8573, Japan.
Nanoscale (Impact Factor: 6.74). 12/2011; 3(12):5067-75. DOI: 10.1039/c1nr10883b
Source: PubMed

ABSTRACT We have developed a polymer film based plasmonic device whose optical properties are tuned for measuring biological samples. The device has a circular nanohole array structure fabricated with a nanoimprint technique using a UV curable polymer, and then gold thin film is deposited by electron beam deposition. Therefore, the device is mass-producible, which is also very important for bioaffinity sensors. First the gold film thickness and hole depth were optimized to obtain the maximum dip shift for the reflection spectra. The dip shift is equivalent to the sensitivity to refractive index changes at the plasmonic device surface. We also calculated the variation in reflection spectra by changing the above conditions using the finite-difference time domain method, and we obtained agreement between the theoretical and experimental curves. The nanohole periodicity was adjusted from 400 to 900 nm to make it possible to perform measurements in the visible wavelength region to measure the aqueous samples with less optical absorption. The tuned bottom filled gold nanohole array was incorporated in a microfluidic device covered with a PDMS based microchannel that was 2 mm wide and 20 μm deep. As a proof of concept, the device was used to detect TNF-α by employing a direct immunochemical reaction on the plasmonic array, and a detection limit of 21 ng mL(-1) was obtained by amplification with colloidal gold labeling instead of enzymatic amplification.

  • Source
    [Show abstract] [Hide abstract]
    ABSTRACT: For several decades the plasmonic behavior of materials have been almost exclusively studied in visible region. Emerging applications require, however, the development of efficient materials operating in UV range. In UV nanoplasmonics aluminum (Al) can play a leading role due to its advantageous electronic properties. Yet, there is still lack of reproducible method to obtain Al nanostructures with desired parameters. Al nanoconcaves can provide a way to overcome these limitations. Here, two different periodicities of the Al nanoconcaves arrays were analyzed. It was observed that the Al concaves can dramatically reduce the optical reflectivity as compared to flat, unstructured Al. At the same time pronounced reflectivity dips were discernible, which were ascribed to (0,1) plasmonic mode. The positions of the dips were at around 250 nm and 350 nm for Al concaves with interpores distance (Dc) of 246,3 nm and 456,7 nm, respectively. The refractive index sensitivity (RIS) was: ~191 nm/RIU for the Al concaves with Dc = 246,3 nm, and ~ 291 nm/RIU for the Al nanoconcaves arrays with Dc = 456,7 nm.
    Current Applied Physics 11/2014; · 2.03 Impact Factor
  • Source
    [Show abstract] [Hide abstract]
    ABSTRACT: Structured films with periodic arrays of nanoholes covered by half-cone shells are fabricated via a simple and efficient colloidal lithography method. The designed films show strong polarization dependence in optical transmission. By decreasing the height of half-cone shells the peak shifts and this shift varies strongly for different orthogonal polarizations. Furthermore, the three-dimensional (3D) asymmetric arrays exhibit a pronounced increase in the transmission intensity by changing the direction of the incident light from the half-cone shell (shelter) side to the empty side. Special surface plasmon resonances excited by the unique 3D asymmetric structure are responsible for these novel properties, and the experimental results are in good agreement with numerical simulations. The nanostructured films in this work will be useful for metallic nanophotonic elements in many applications, including surface plasmon enhanced optical sensing and ultrafast optical switching, as well as versatile substrates for surface enhanced Raman spectroscopy, anisotropic wettability and other potential uses.
    Nanoscale 06/2014; · 6.74 Impact Factor
  • [Show abstract] [Hide abstract]
    ABSTRACT: We describe a highly efficient method for fabricating controllable and reliable sub-20 nm scale nano-gap structures through an elastomeric nano-stamp with an embedded ultra-thin pattern. The stamp consists of ultrahigh resolution (approximately 10 nm) and high aspect ratio (ca. 15) metal nano-structures, which are obtained by secondary sputtering lithography (SSL). The nano-gap structures fabricated in this fashion achieve a high resolution and meet the requirements of minimal cost, high reliability, controllability, reproducibility, and applicability to different materials. Further, we demonstrate that this method enables the fabrication of SERS substrates for detection at the single-molecule level.
    Nanoscale 04/2014; · 6.74 Impact Factor


1 Download
Available from