Properties of gold nanostructures sputtered on glass

Department of Solid State Engineering, Institute of Chemical Technology, Technicka 5, 166 28 Prague, Czech Republic. .
Nanoscale Research Letters (Impact Factor: 2.78). 01/2011; 6(1):96. DOI: 10.1186/1556-276X-6-96
Source: PubMed


We studied the electrical and optical properties, density, and crystalline structure of Au nanostructures prepared by direct current sputtering on glass. We measured temperature dependence of sheet resistance and current-voltage characteristics and also performed scanning electron microscopy [SEM] analysis of gold nanolayers. It was shown that within the wide range of temperatures, gold nanolayers (<10 nm) exhibit both metal and semiconducting-like type of conductivity. UV/Vis analysis proved the semiconducting characteristic of intrinsic Au clusters. SEM analysis showed the initiatory stadium of gold layer formation to be running over isolated islands. Gold density calculated from the weight and effective thickness of the layers is an increasing function of the layer thickness up to approximately 100 nm. In thin layers deposited on solid surface, a lattice expansion is observed, which is manifested in the increase of the lattice parameter and the decrease of metal density. With increasing layer thickness, the lattice parameter and the density approach the bulk values.

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    • "In the time interval 0-30 s the transmittance of the growing film remains lower than that predicted by exponential fit, whereas at deposition time longer than 30 s, the transmittance curves lie above the exponential fit and approach to it at deposition time longer than 100 s. The specific dependence of the transmittance around the deposition time 30 s should be attributed to the well-known localized plasmon-polariton effect in a non-uniform, ultra-thin metal film [6] [7] [8] [9] [10] [11] [12] [13] [14]. We distinguish between two plasmon-related effects: the reduced transmittance in the time interval 0-30 s is due to enhanced absorption of light by isolated metal islands, and the higher transmittance for deposition time longer , than 30 s, more likely is due to plasmon-mediated enhanced transmission through nano-holes [27] [28] [29] formed between merged metal clusters. "
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    Thin Solid Films 01/2015; 31. DOI:10.1016/j.tsf.2015.01.046 · 1.76 Impact Factor
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    • "ρ Au and ρ Si are density of a-Au and a-Si, respectively. In previous studies, density of a-Au was roughly estimated to be around 9.1 g/cm 3 in [24], while a-Si was evaluated to be 2.33 g/cm 3 in [25]. In Au 1−x Si x , Si composition of the thin film used in this study is equivalent to x = 0.904. "
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    Journal of Crystallization Process and Technology 10/2014; 4(4):193-205. DOI:10.4236/jcpt.2014.44024
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    • "A possible explanation is provided below. Alternatively , this phenomenon may be caused by an increase of the number of isolated gold nanoclusters [26] [32], which aggregate and " push " each other, which in turn increases the biaxial tension. On the other hand, the lattice parameter decreases due to internal stress relaxation during nanocluster growth. "
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    ABSTRACT: Properties of gold films sputtered onto borosilicate glass substrate were studied. UV-Vis absorption spectra were used to investigate optical parameters. XRD analysis provided information about the gold crystalline nanostructure, the texture, and lattice parameter and biaxial tension was also determined by the XRD method. The surface morphology was examined by atomic force microscopy (AFM); chemical structure of sputtered gold nanostructures was examined by X-ray photoelectron spectroscopy (ARXPS). The gold crystallites are preferentially [111] oriented on the sputtered samples. Gold deposition leads to dramatic changes in the surface morphology in comparison to pristine glass substrate. Oxygen is not incorporated into the gold layer during gold deposition. Experimental data on lattice parameter were also confirmed by theoretical investigations of nanoclusters using tight-binding potentials.
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