Article

The initial stage of the dissociative adsorption and the surface electronic state evolution of NH(3) on Si(111)-(7 × 7).

State Key Laboratory of Magnetic Resonance and Atomic and Molecular Physics, Wuhan Institute of Physics and Mathematics, Chinese Academy of Sciences, Wuhan 430071, People's Republic of China. Graduate School of the Chinese Academy of Sciences, Beijing 100039, People's Republic of China.
Journal of Physics Condensed Matter (impact factor: 2.55). 01/2010; 22(8):085002. DOI:10.1088/0953-8984/22/8/085002
Source: PubMed

ABSTRACT Adsorption of NH(3) molecules on Si(111)-(7 × 7) has been studied by scanning tunneling microscopy. We find that the dissociative adsorption is site-selective and exhibits two adsorption structures resulting from different reaction channels: [Formula: see text] and [Formula: see text]. To explain the dissociation processes, an adsorption model for these reactions is given. Furthermore, the evolution of the local electronic structures is investigated by means of atomically resolved scanning tunneling spectroscopy to clarify the effect of different fragments on the surface states. Finally, we discuss the adsorption position of H atoms from the NH(3) dissociation.

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Keywords

Adsorption
 
adsorption model
 
adsorption position
 
clarify
 
different fragments
 
different reaction channels
 
dissociation processes
 
dissociative adsorption
 
exhibits
 
reactions
 
scanning tunneling microscopy
 
scanning tunneling spectroscopy
 
surface states