Article

The transition between conformal atomic layer epitaxy and nanowire growth.

Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany.
Journal of the American Chemical Society (impact factor: 9.91). 06/2010; 132(22):7592-4. DOI:10.1021/ja102590v pp.7592-4
Source: PubMed

ABSTRACT Conformal atomic layer deposition of thin Sb(2)S(3) layers takes place epitaxially on suitable substrates at 90 degrees C. More elevated deposition temperatures increase the mobility of the solid and result in the diffusion of Sb(2)S(3) along surface energy gradients. On an Sb(2)Se(3) wire that presents the high-energy c facet at its extremity, this results in the axial elongation of the wire with a Sb(2)S(3) segment. When an Sb(2)S(3) wire whose c planes are exposed on the sides is used as the substrate, the homoepitaxy collects material laterally and yields a nano-object with a rectangular cross section.

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Keywords

Conformal atomic layer deposition
 
deposition temperatures increase
 
diffusion
 
high-energy c facet
 
nano-object
 
place epitaxially
 
presents
 
solid
 
substrate
 
suitable substrates
 
surface energy gradients