Graphene nanomesh

Department of Materials Science and Engineering, University of California, Los Angeles, California 90095, USA.
Nature Nanotechnology (Impact Factor: 33.27). 02/2010; 5(3):190-4. DOI: 10.1038/nnano.2010.8
Source: PubMed

ABSTRACT Graphene has significant potential for application in electronics, but cannot be used for effective field-effect transistors operating at room temperature because it is a semimetal with a zero bandgap. Processing graphene sheets into nanoribbons with widths of less than 10 nm can open up a bandgap that is large enough for room-temperature transistor operation, but nanoribbon devices often have low driving currents or transconductances. Moreover, practical devices and circuits will require the production of dense arrays of ordered nanoribbons, which remains a significant challenge. Here, we report the production of a new graphene nanostructure--which we call a graphene nanomesh--that can open up a bandgap in a large sheet of graphene to create a semiconducting thin film. The nanomeshes are prepared using block copolymer lithography and can have variable periodicities and neck widths as low as 5 nm. Graphene nanomesh field-effect transistors can support currents nearly 100 times greater than individual graphene nanoribbon devices, and the on-off ratio, which is comparable with the values achieved in individual nanoribbon devices, can be tuned by varying the neck width. The block copolymer lithography approach used to make the nanomesh devices is intrinsically scalable and could allow for the rational design and fabrication of graphene-based devices and circuits with standard semiconductor processing.

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Available from: Xiangfeng Duan, Jul 31, 2015
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    • "Many experimental techniques for fabrication of GALs have been developed to verify the interesting quantum mechanical effects predicted by theory. Graphene films with antidot diameters of 20-150 nm, spacing between the antidots of less than10 nm and cell sizes of 35-400 nm have been fabricated via electron beam lithography, nano imprint lithography, block copolymer lithography, and self-assembling of monodispersed colloidal microspheres ( Begliarbekov, M. et al. 2011) (Bai, J. W. et al. 2010) (Liang, X. et al. 2010). "
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    ABSTRACT: The zero band gap (Eg) graphene becomes narrow Eg semiconductor when graphene is patterned with periodic array of hexagonal shaped antidots, the resultant is the hexagonal Graphene Antidot Lattice (hGAL). Based on the number of atomic chains between antidots, hGALs can be even and odd. The even hGALs (ehGAL) are narrow Eg semiconductors and odd hGALs (ohGAL) are semi-metals. The Eg opening up by hGALs is not sufficient to operate a realistic switching transistor. Also hGAL transistors realized on Si/SiO2 substrate are suffering with low carrier mobility and ON-OFF current ratio. In order to achieve a sizable Eg with good mobility, AB Bernal stacked hGALs on hexagonal Boron Nitride (hBN), ABA Bernal stacked hBN / hGAL / hBN sandwiched structures and AB misaligned hGAL /hBN structures are reported here for the first time. Using the first principles method the electronic structure calculations are performed. A sizable Eg of about 1.04 eV (940+100 meV ) is opened when smallest neck width medium radius ehGAL supported on hBN and about 1.1 eV (940 + 200 meV ) is opened when the same is sandwiched between hBN layers. A band gap on the order of 71 meV is opened for Bernal stacked ohGAL / hBN and nearly 142 meV opened for hBN / ohGAL /hBN structures for smallest radius and width of nine atomic chains between antidots. Unlike a misaligned graphene on hBN, the misaligned ohGAL/hBN structure shows increased Eg. This study could open up new ways of band gap engineering for graphene based nanostructures. Keywords: Graphene, graphene antidots, hexagonal boron nitride, band structure, band gap engineering
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