A two-step etching technique for silica terraces in the PLC hybrid integration

Opt. Commun. Devices Res. Dept., Electron. & Telecommun. Res. Inst., Daejeon, South Korea
IEEE Photonics Technology Letters (Impact Factor: 2.04). 12/2004; DOI: 10.1109/LPT.2004.835219
Source: IEEE Xplore

ABSTRACT Two-step etching, after the full processes of a silica waveguide, was performed to fabricate a silica-terraced planar lightwave circuit platform for the hybrid integration of optoelectronic devices. Spot-size converted distributed feedback laser diodes (SSC DFB LDs) were flip-chip bonded on silica terraces with the height accuracy of less than 1 μm, and the resultant coupling loss between the SSC DFB LD and the silica waveguide was about 3.78 dB. The light-current curve of the LD flip-chip bonded on the platform showed the almost linear increase of the output power without any saturation.