Article

Vacuum arc ion sources for particle accelerators and ion implantation

Lawrence Berkeley Lab., California Univ., Berkeley, CA
IEEE Transactions on Plasma Science (impact factor: 1.17). 11/1993; DOI:10.1109/27.249640 pp.537 - 546
Source: IEEE Xplore

ABSTRACT The vacuum arc is a generator of highly ionized metal plasma. This
method of plasma production can be used to construct a high-current
metal ion source. A succession of such metal-vapor vacuum arc ion
sources has been developed at Berkeley. Beams from 50 of the solid
metals of the periodic table have been produced with mean ion energy up
to several hundred keV, and with pulsed beam currents in the ampere
range. Typically the source is repetitively pulsed with a pulse length
of 250 μs and a duty cycle of the order of 1%. A DC embodiment from
which a large-area titanium beam with steady-state ion current of 600 mA
was produced has been tested. A 50-cm-diameter set of beam formation
grids has been used to form a beam of area 1000 cm2 at an
energy of 100 keV and a pulsed beam current of approximately 10 A. The
source can also be seen as a tool for the study of vacuum arc plasmas.
Vacuum arc ion charge state distributions have been studied in this way.
The general features and performance characteristics of the sources and
their use for accelerator injection and ion implantation applications
are described

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    Conference Proceeding: A method of producing very high resistivity surface conduction on ceramic accelerator components using metal ion implantation
    F. Liu, I. Brown, L. Philips, G. Biallas, T. Siggins
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    ABSTRACT: An important technique used for the suppression of surface flashover on high voltage DC ceramic insulators as well as for RF windows is that of providing some surface conduction to bleed off accumulated surface charge. We have used metal ion implantation to modify the surface of high voltage ceramic vacuum insulators to provide a uniform surface resistivity of approximately 5×10<sup>10</sup> Ω/square. A vacuum arc ion source based implanter was used to implant Pt at an energy of about 135 keV to doses of up to more than 5×10<sup>16</sup> ions/cm<sup>2</sup> into small ceramic test coupons and also into the inside surface of several ceramic accelerator columns 25 cm I.D. by 28 cm long. Here we describe the experimental set-up used to do the ion implantation and summarize the results of our exploratory work on implantation into test coupons as well as the implantations of the actual ceramic columns
    Particle Accelerator Conference, 1997. Proceedings of the 1997; 06/1997
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Keywords

50-cm-diameter
 
accelerator injection
 
Beams
 
DC embodiment
 
general features
 
hundred keV
 
ion energy
 
ion implantation applications
 
ionized metal plasma
 
large-area titanium beam
 
periodic table
 
plasma production
 
pulse length
 
pulsed beam current
 
pulsed beam currents
 
steady-state ion current
 
vacuum arc
 
Vacuum arc ion charge state distributions
 
vacuum arc plasmas