Article
1-Gb/s 80-dBΩ fully differential CMOS transimpedance amplifier in multichip on oxide technology for optical interconnects
Sch. of Electr. Eng., Univ. of Ulsan, South Korea
IEEE Journal of Solid-State Circuits (impact factor:
3.23).
07/2004;
DOI:10.1109/JSSC.2004.827795
pp.971 - 974
Source: IEEE Xplore
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Citations (0)
- Cited In (3)
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Article: A fully CMOS optical transmission system based on light emitting avalance diodes
[show abstract] [hide abstract]
ABSTRACT: The successful realization of optical interconnects for inter-and intra-chip communication strongly depends on the use of a light source that is compatible with existing, well established manufacturing processes – primarily CMOS/VLSI. The problematic integration of III-V light sources with CMOS technology has not been surmounted thus far. While silicon is ill-suited as an optical material, silicon based light sources present a huge advantage: complete monolithic integration using existing CMOS processes. This advantage can only be exploited if these devices show sufficient switching speed and optical power emission to make high speed clock and data transmission feasible. This paper illustrates the switching speed of silicon based light emitting devices in excess of 100 MHz and the viability of using such a device for an all-silicon optical link for clock and data distribution.04/2010; 101. -
Article: Low-noise differential transimpedance amplifier structure based on capacitor cross-coupled g
Microelectronics Journal. 01/2008; 39:1843-1851. -
Article: Low-noise differential transimpedance amplifier structure based on capacitor cross-coupled< i> g < sub> m</sub>-boosting scheme
Microelectronics Journal 01/2008; 39(12):1843-1851. · 0.92 Impact Factor
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Keywords
-40-dB crosstalk
0.25-μm standard CMOS technology
1-Gb/s differential transimpedance amplifier
1-pF photodiode capacitance
27-mW power dissipation
adjacent channels
four-channel MCO TIA array
multichip-on-oxide
negligible switching noise effect
optical interconnects
p-i-n photodiode
TIA chip