Article

Investigations of whisper gallery mirrors for extreme ultraviolet (EUV) and soft X-rays

Res. Lab. of Electron., MIT, Cambridge, MA
IEEE Journal of Quantum Electronics (impact factor: 1.88). 06/1992; DOI:10.1109/3.135280 pp.1376 - 1383
Source: IEEE Xplore

ABSTRACT The authors have examined optical constants and predicted
reflectivities of candidate surface coatings for whisper gallery mirrors
(WGMs) in the extreme ultraviolet. The spectral regime near 100-150
Å has been identified in the literature as particularly promising
due to the high WGM reflectivities of the noble metals in the vicinity
of their Cooper minima in this regime. The authors confirm this basic
result using newer EUV optical data, and they have sought candidate
surface materials which would extend the range over which WGMs may be
used to longer wavelengths. It is found that substantial WGM
reflectivities are predicted for a variety of elements in the EUV, and
that TE peak reflection is larger than TM peak reflection by on the
order of 10%; however, most of the elements which do reflect well have
surfaces which are vulnerable to oxygen contamination

0 0
 · 
0 Bookmarks
 · 
12 Views
Data provided are for informational purposes only. Although carefully collected, accuracy cannot be guaranteed. The impact factor represents a rough estimation of the journal's impact factor and does not reflect the actual current impact factor. Publisher conditions are provided by RoMEO. Differing provisions from the publisher's actual policy or licence agreement may be applicable.

Keywords

candidate surface coatings
 
newer EUV optical data
 
oxygen contamination
 
reflectivities
 
spectral regime
 
surfaces
 
TE peak reflection
 
TM peak reflection
 
vicinity
 
wavelengths
 
WGM reflectivities
 
WGMs
 

T.-Y. Hung