Article
Structural origin of copper ion containing artificial DNA: a density functional study.
Department of Applied Chemistry, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan.
The Journal of Physical Chemistry B (impact factor:
3.7).
01/2009;
112(51):16960-5.
DOI:10.1021/jp8080707
pp.16960-5
Source: PubMed
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Keywords
Anderson-Langreth-Lindqvist van der Waals
antiferromagnetic
calculated distance
conjecture
copper ion
copper ions
density functional theory
Evaluated stacking energy
experimental data
ferromagnetic
hydroxypyridone
inter-base-pair interaction
natural B-DNA
planar structure
smaller
spin-spin interaction
stacking energy
structural stability
two bases
vdW interaction