Thin film deposition by PECVD using HMDSO-O 2 Ar gas mixture on knitted wool fabrics in order to improve pilling resistance
ABSTRACT In this work knitted wool fabrics were coated by a Si:Ox:Cy:Hz thin film with the aim to promote pilling resistance. The wool samples were plasma coated in a radio frequency (RF) glow
discharge using hexamethyldisiloxane (HMDSO) as the precursor, in mixture with argon and oxygen gases, for different deposition
times and reaction pressures, at constant discharge power. Deposited films were characterized by means of Fourier transform
infrared (FTIR) spectroscopy and surface morphology by means of scanning electron microscopy; moreover, propensity to pilling
of treated samples was investigated, showing that treated fabrics had a better pilling performance respect to untreated ones.
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- "Pills are cluster or tangle of a number of fibers rounded off into the shape of small tufts, which are created by friction and coiling on the surface of the textile fabric. An anti-pilling finish should be able to cement the fibers within the yarn so that their dragging becomes more difficult , without handle worsening (Rombaldoni et al., 2008). For this reason, one can suppose that a similar effect could also be obtained by chitosan functionalization of fiber surface. "
ABSTRACT: The aim of this study was the surface modification of wool fibers to confer a multifunctional finishing to the fabrics, improving the textile value and its applications without damage of comfort properties. The attention was focused on an economical and environmental friendly process to obtain an effective treatment with good durability to washing. Chitosan in acetic acid solution was applied by padding, and grafted by ultraviolet radiation, through radical reactions promoted by a photoinitiator. 2% chitosan grafted was enough to confer satisfactory antimicrobial activity (67% reduction of Escherichia coli) after an oxidative wool pre-treatment and 1h impregnation at 50°C. Moreover treated wool fabrics showed a strong dyeability increase toward acid dye. However the evaluation of the treatment durability to laundering showed different behavior depending on the nature of the surfactants. Finally, anti-felting properties with respect to untreated fabrics were revealed, while no effect was shown toward anti-pilling properties.10/2013; 98(1):624-9. DOI:10.1016/j.carbpol.2013.06.054
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ABSTRACT: This work concerns the study of some important physical and mechanical properties of a wool fabric treated with a roll-to-roll atmospheric plasma jet equipment. The plasma pilot unit, based on a post-discharge technology, was equipped with an innovative plasma-to-fabric contactor, which promotes a relevant penetration of plasma through the fabric structure and geometrically defines the atmosphere. Wool fabrics were processed at three different velocities (1, 3 and 6 m/min); the other process variables were kept constant. Tensile strength, elongation at break, surface thickness, wettability and air permeability increased after the plasma treatment, while several low-stress mechanical properties, strictly related to the handle, were not modified. SEM analysis was also carried out to better interpret the above macroscopic results.Journal of Materials Processing Technology 03/2010; 210(5-210):720-726. DOI:10.1016/j.jmatprotec.2009.12.006 · 2.04 Impact Factor
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ABSTRACT: New data shed light on the mechanisms of film growth from low power, low pressure plasmas of organic compounds. These data rebalance the widely held view that plasma polymer formation is due to radical/neutral reactions only and that ions play no direct role in contributing mass at the surface. Ion reactions are shown to play an important role in both the plasma phase and at the surface. The mass deposition rate and ion flux in continuous wave hexamethyl disiloxane (HMDSO) plasmas have been studied as a function of pressure and applied RF power. Both the deposition rate and ion flux were shown to increase with applied power; however, the deposition rate increased with pressure while the ion flux decreased. Positive ion mass spectrometry of the plasma phase demonstrates that the dominant ionic species is the (HMDSO-CH(3))(+) ion at m/z 147, but significant fragmentation and subsequent oligomerization was also observed. Chemical analysis of the deposits by X-ray photoelectron spectroscopy and secondary ion mass spectrometry show that the deposits were consistent with deposits reported by previous workers grown from plasma and hyperthermal (HMDSO-CH(3))(+) ions. Increasing coordination of silicon with oxygen in the plasma deposits reveals the role of ions in the growth of plasma polymers. Comparing the calculated film thicknesses after a fixed total fluence of 1.5 × 10(19) ions/m(2) to results for hyperthermal ions shows that ions can contribute significantly to the total absorbed mass in the deposits.Langmuir 08/2011; 27(19):11943-50. DOI:10.1021/la202010n · 4.46 Impact Factor