La variabilidad del flujo espiratorio máximo no clasifica el asma por niveles de gravedad
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ABSTRACT: Objective To assess concordance in the measurement of peak expiratory flow (PEF) and forced expiratory volume in one second (FEV1) between the portable device Piko-1 (Ferraris) and a pneumotachograph.Patients and methodsForced spirometry (Master Screen Jaeger) was performed according to ATS/ERS norms, selecting the best value of three curves, and three measurements with the Piko-1 were recorded, following the recommendations of the manufacturer.ResultsEighty patients between 5–18 years of age were studied. Based on the Bland-Altman method, the mean differences obtained were 9.82 (95%CI: 2.43–17.21) for PEF and 0.17 (95%CI: 0.12–0.21) for FEV1. The intraclass correlation coefficient was 0.96 (p<0,001; 95%CI: 0.93–0.97) for FEV1 and 0.93 (p<0,001; 95%CI: 0.89–0.95) for PEF.Conclusions Piko-1 offers FEV1 measurements close to those obtained with forced spirometry, thus allowing more exact patient assessment in home-based follow-up, emergency services, or hospital wards.Allergologia et Immunopathologia 09/2009; 37(5):244–248. DOI:10.1016/j.aller.2009.03.004 · 1.58 Impact Factor
Conference Paper: Characterization of a MEMS biochip for planar patch-clamp recording[Show abstract] [Hide abstract]
ABSTRACT: The paper explores the transport of ions through a micropore as a precursor to the fabrication of an integrated planar patch-clamp measurement system on a microelectronic biochip. The paper presents the analytical model to estimate the series resistance and capacitance of a planar patch-clamp structure. The cross-sectional area, thickness of the membrane and the electrolyte concentrations are key factors in determining the series resistance of the chip. The net capacitance of the substrate is sum of the nitric-oxide layer capacitances on both sides of the wafer and that of the nitride membrane. Experimental data compared with theoretical model showed good result without any correction factor. The measured capacitance value is reasonably closer to the calculated value and the higher substrate capacitance value can be reduced by minimising the fluid area in contact with the chip.Semiconductor Device Research Symposium, 2003 International; 01/2004
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