Article

Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires.

Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027, USA.
Optics Letters (impact factor: 3.4). 01/2009; 33(24):2889-91. pp.2889-91
Source: PubMed

ABSTRACT We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.

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Keywords

dispersion characteristics
 
effective nonlinearity
 
phase-matched
 
processes
 
Si core
 
Si nanophotonic wires
 
strong modal confinement
 
thin conformal silicon nitride film