Free-Standing Mechanical and Photonic Nanostructures in Single-Crystal Diamond

Nano Letters (Impact Factor: 13.59). 11/2012; 12(12). DOI: 10.1021/nl302541e
Source: PubMed


A variety of nanoscale photonic, mechanical, electronic, and optoelectronic devices require scalable thin film fabrication. Typically, the device layer is defined by thin film deposition on a substrate of a different material, and optical or electrical isolation is provided by the material properties of the substrate or by removal of the substrate. For a number of materials this planar approach is not feasible, and new fabrication techniques are required to realize complex nanoscale devices. Here, we report a three-dimensional fabrication technique based on anisotropic plasma etching at an oblique angle to the sample surface. As a proof of concept, this angled-etching methodology is used to fabricate free-standing nanoscale components in bulk single-crystal diamond, including nanobeam mechanical resonators, optical waveguides, and photonic crystal and microdisk cavities. Potential applications of the fabricated prototypes range from classical and quantum photonic devices to nanomechanical-based sensors and actuators.

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Available from: Nathalie de Leon, Jan 21, 2014
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    • "This etching technique can also be applied to etch other semiconductor materials and no additional mask is required to be deposited on the substrates . There are a few reports of using the Faraday cage to etch Si [18] [19], oblique incident angle etching of SiO 2 , Si 3 N 4 [20] and to etch diamond at certain angles [21]. Detailed modeling and functionality of Faraday cages in plasma etching can be found in [18–20,22–25]. "
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