Article

Preparation of TiO2 thin film by the LPD method on functionalized organic self-assembled monolayers

Science in China Series E Technological Sciences (impact factor: 1.02). 05/2012; 52(1):137-140. DOI:10.1007/s11431-008-0332-1

ABSTRACT In this paper, uniform titania (TiO2) films have been formed at 50° on silanol SAMs by the liquid-phase deposition (LPD) method at a temperature below 100°C.
OTS (Octadecyltrichloro-Silane) self-assembled monolayers (SAMs) on glass wafers were used as substrates for the deposition
of titanium dioxide thin films. This functionalized organic surface has shown to be effective for promoting the growth of
films from titanic aqueous solutions by the LPD method at a low temperature below 100°C. The crystal phase composition, microstructure
and topography of the as-prepared films were characterized by various techniques, including X-ray diffraction (XRD), scanning
electron microscopy (SEM), and atomic force microscopy (AFM). The results indicate that the as-prepared thin films are purely
crystallized anatase TiO2 constituted by nanorods after being annealed at 500°. The pH values, concentration of reactants, and deposition temperatures
play important roles in the growth of TiO2 thin films.

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Keywords

annealed
 
as-prepared films
 
as-prepared thin films
 
atomic force microscopy
 
crystal phase composition
 
crystallized anatase TiO2 constituted
 
deposition temperatures
 
electron microscopy
 
glass wafers
 
low temperature
 
LPD
 
LPD method
 
SAMs
 
silanol SAMs
 
TiO2 thin films
 
titanic aqueous solutions
 
titanium dioxide thin films
 
uniform titania
 
various techniques
 
X-ray diffraction
 

ZhongLiang He