Atomic layer deposition of titanium dioxide thin films from tetraethoxytitanium and water
ABSTRACT The structure and chemical composition of the titanium dioxide thin films formed by atomiclayer deposition (ALD) from tetraethoxytitanium
and water precursors were studied by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, grazing incidence
X-ray diffraction, Fourier transform infrared spectroscopy, and atomic force microscopy. The deposited films were demonstrated
to have good stoichiometry and anatase type polycrystalline structure. The growth per cycle of titanium dioxide was calculated
by an ALD model taking into account the sizes and number of ligands in reactant molecules.