Article

Atomic layer deposition of titanium dioxide thin films from tetraethoxytitanium and water

Journal of Surface Investigation X-ray Synchrotron and Neutron Techniques (impact factor: 0.34). 04/2012; 4(3):379-383. DOI:10.1134/S1027451010030043 pp.379-383

ABSTRACT The structure and chemical composition of the titanium dioxide thin films formed by atomiclayer deposition (ALD) from tetraethoxytitanium
and water precursors were studied by Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, grazing incidence
X-ray diffraction, Fourier transform infrared spectroscopy, and atomic force microscopy. The deposited films were demonstrated
to have good stoichiometry and anatase type polycrystalline structure. The growth per cycle of titanium dioxide was calculated
by an ALD model taking into account the sizes and number of ligands in reactant molecules.

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Keywords

anatase type polycrystalline structure
 
atomic force microscopy
 
chemical composition
 
deposited films
 
good stoichiometry
 
infrared spectroscopy
 
reactant molecules
 
Rutherford backscattering spectrometry
 
sizes
 
tetraethoxytitanium
 
titanium dioxide thin films
 
water precursors
 
X-ray photoelectron spectroscopy
 

A. P. Alekhin