Conference Proceeding
Transformer topologies for mmW integrated circuits
IMS Lab., Univ. of Bordeaux, Talence, France
11/2009;
pp.181 - 184 In proceeding of: Microwave Conference, 2009. EuMC 2009. European
Source: IEEE Xplore
-
Citations (0)
- Cited In (2)
-
Article: Design and characterization of CMOS millimeter-wave transformers
[show abstract] [hide abstract]
ABSTRACT: A comprehensive analysis of the impact of geometric parameters on the design of millimeter-wave integrated transformers is presented. Transformers presenting the same stacked topology but different diameters and trace widths were fabricated in a 65 nm CMOS technology and their performance was compared in terms of inductance, quality-factors, coupling coefficient and minimum insertion loss. Results of electromagnetic simulation and measurement are exposed, showing an excellent agreement in a wide frequency band. It is observed that transformers with different diameters present similar performances but different resonance frequencies, whereas transformers with wider traces can present better minimum insertion loss results. -
Conference Proceeding: Design and characterization of CMOS millimeter-wave transformers
[show abstract] [hide abstract]
ABSTRACT: A comprehensive analysis of the impact of geometric parameters on the design of millimeter-wave integrated transformers is presented. Transformers presenting the same stacked topology but different diameters and trace widths were fabricated in a 65 nm CMOS technology and their performance was compared in terms of inductance, quality-factors, coupling coefficient and minimum insertion loss. Results of electromagnetic simulation and measurement are exposed, showing an excellent agreement in a wide frequency band. It is observed that transformers with different diameters present similar performances but different resonance frequencies, whereas transformers with wider traces can present better minimum insertion loss results.Microwave and Optoelectronics Conference (IMOC), 2009 SBMO/IEEE MTT-S International; 12/2009
Data provided are for informational purposes only. Although carefully collected, accuracy cannot be guaranteed.
The impact factor represents a rough estimation of the journal's impact factor and does not reflect the actual
current impact factor.
Publisher conditions are provided by RoMEO. Differing provisions from the publisher's actual policy or licence
agreement may be applicable.
Keywords
180 degrees present
65 nm CMOS technology
inductance
minimum insertion loss
partial resonance
quality-factors
relative position
windings present different shapes