Photoluminescence and passivation of silicon nanostructures
ABSTRACT A new method was used to fabricate nanometer‐scale structures in Si for photoluminescence studies. Helium ions were implanted to form a dense subsurface layer of small cavities (1–16 nm diameter). Implanted specimens subjected to annealing in a variety of atmospheres yielded no detectable photoluminescence. However, implantation combined with electrochemical anodization produced a substantial blueshift relative to anodization alone. This blueshift is consistent with the quantum confinement model of photoluminescence in porous silicon.