Gain and fluorescence measurements in photoionization‐stabilized XeF discharge lasers operating at high‐energy loadings
ABSTRACT A recently developed simple photopreionization‐stabilized discharge scheme was adapted successfully to the excitation of XeF and KrF lasers at pressures of 0–1500 Torr. The authors report on the stabilization and excitation characteristics of F 2 and NF 3 : Xe : He discharges over a wide range of energy loadings. These results summarize and compare the detailed fluorescence and gain measurements. The (nonoptimized) XeF output energies of ∼1 J/liter compare favorably with those of other devices.
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ABSTRACT: An optical oscillator-amplifier series driven by a Blumlein discharge has been fabricated and optimized for measuring the small-signal gain and saturation intensity of a XeF (B ? X) laser at 352 nm. Pressure dependence of the gain and the saturation property of the laser have been investigated.Applied Optics 03/1997; 36(6):1139-42. · 1.41 Impact Factor