Article

Gain and fluorescence measurements in photoionization‐stabilized XeF discharge lasers operating at high‐energy loadings

Ames Research Center, NASA, Moffett Field, California 94035
Applied Physics Letters (impact factor: 3.84). 09/1977; DOI:10.1063/1.89626
Source: IEEE Xplore

ABSTRACT A recently developed simple photopreionization‐stabilized discharge scheme was adapted successfully to the excitation of XeF and KrF lasers at pressures of 0–1500 Torr. The authors report on the stabilization and excitation characteristics of F 2 and NF 3  : Xe : He discharges over a wide range of energy loadings. These results summarize and compare the detailed fluorescence and gain measurements. The (nonoptimized) XeF output energies of ∼1 J/liter compare favorably with those of other devices.

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