Conference Proceeding
Three technologies for a smart miniaturized gas-sensor: SOI CMOS, micromachining, and CNTs - challenges and performance
Univ. of Cambridge, Cambridge
01/2008;
DOI:10.1109/IEDM.2007.4419077
pp.831 - 834 In proceeding of: Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Source: IEEE Xplore
- Citations (16)
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Cited In (0)
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Article: Micromachined metal oxide gas sensors: opportunities to improve sensor performance
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ABSTRACT: This review deals with gas sensors combining a metal oxide based sensing layer and a substrate realized by using micromachining. It starts by giving an overview of the design principles and technology involved in the fabrication of micromachined substrates examining thermal and mechanical aspects. Both kinds of micromachined substrates, closed-membrane-type and the suspended-membrane-type, are discussed. The deposition of the sensing layer is complicated by the mechanical fragility of the micromachined substrates. Different approaches used for the formation of the sensing layer such as thin film and thick film deposition techniques are reviewed. Finally, the gas sensing function of the sensitive layer is analyzed and various ways for extracting the information are presented with respect to the improvement of sensor performance brought by this new approach.Sensors and Actuators B: Chemical. -
Article: Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processing
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ABSTRACT: A monolithic tin oxide (SnO/sub 2/) gas sensor realized by commercial CMOS foundry fabrication (MOSIS) and postfabrication processing techniques is reported. The device is composed of a sensing film that is sputter-deposited on a silicon micromachined hotplate. The fabrication technique requires no masking and utilizes in situ process control and monitoring of film resistivity during film growth. Microhotplate temperature is controlled from ambient to 500 degrees C with a thermal efficiency of 8 degrees C/mW and thermal response time of 0.6 ms. Gas sensor responses of pure SnO/sub 2/ films to H/sub 2/ and O/sub 2/ with an operating temperature of 350 degrees C are reported. The fabrication methodology allows integration of an array of gas sensors of various films with separate temperature control for each element in the array, and circuits for a low-cost CMOS-based gas sensor system.< >IEEE Electron Device Letters 04/1993; · 2.85 Impact Factor -
Article: CMOS microhotplate sensor system for operating temperatures up to 500 C
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ABSTRACT: A monolithic gas sensor microsystem fabricated in industrial CMOS-technology combined with post-CMOS micromachining is presented, which comprises a new type of microhotplate for operating temperatures up to 500 • C and specifically designed on-chip circuitry. These high temperatures can be achieved by using carefully optimized heater geometries and layouts, micropatterned Pt-temperature sensors and Pt-electrodes as well as a post-CMOS local passivation. Moreover, the on-chip Pt-temperature sensor requires a fully differential low-noise amplifier as a consequence of its low overall resistance. A logarithmic converter for measuring the metal-oxide resistance changes upon gas exposure and a bulk chip temperature sensor were co-integrated. The monolithic system was characterized, and operating temperatures up to 500 • C were achieved and controlled at ±2 • C precision. The correlation between input reference voltage and microhotplate temperature was found to be linear, which is advantageous for temperature modulation. A detection limit of less than 1 ppm CO (40% r.h.) was established using a nanocrystalline Pd-doped (0.2 wt.%) tin-oxide thick film as sensitive material. © 2005 Published by Elsevier B.V.Sensors and Actuators B. 01/2006; 117:346-352.
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Keywords
additional heating
CMOS circuitry
CMOS materials
gas-sensitive carbon nanotubes
low-cost
low-power gas sensors
multi-walled CNT resistive gas sensors
new type
novel tungsten-based CMOS micro-hotplates
offer ultra low power consumption
on-chip CNT deposition
reasonable baseline recovery times
recent advances
silicon foundries
silicon-on-insulator CMOS technology
wafer etching