Article

A Generic Foundry Model for InP-based Photonic ICs

IET Optoelectronics (Impact Factor: 0.97). 11/2011; 5(5):187 - 194. DOI: 10.1049/iet-opt.2010.0068
Source: IEEE Xplore

ABSTRACT Similarities and differences between photonic and microelectronic integration technology are discussed and a vision of the development of InP-based photonic integration in the coming decade is given.

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Available from: Norbert Grote, Jul 25, 2014
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    • "The second approach aims to develop a dual wavelength source that can be fabricated on a Generic InP-based technology platform to access the cost reduction of a multi-project wafer run. This approach, limited by the building blocks available on the platform [12], developed a dual wavelength arrayed waveguide grating (AWG) laser structure. These were initially proposed for wavelength division multiplexed sources since they are able to deliver multiple wavelengths, with fixed frequency spacing, defined by the AWG (usually Δλ ß 100 GHz). "
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    Journal of Lightwave Technology 10/2014; 32(20):3495-3501. DOI:10.1109/JLT.2014.2321573 · 2.86 Impact Factor
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    • "As constant improvements in the performance and fabrication yield of photonic integrated circuits is observed [12], there is enough evidence that monolithic photonic integration could offer advantages in terms of a significant reduction in the system footprint, inter-element coupling losses, packaging costs, and system power consumption thanks to the use of a single cooler for multiple functions. Moreover, advances and decreasing fabrication cost in photonic integration have been triggered by the recent availability of numerous generic fabrication platforms [13], thus simplifying the development of advanced integrated photonic systems. 0733-8724 © 2014 IEEE. "
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    Journal of Lightwave Technology 10/2014; 32(20):3893-3900. DOI:10.1109/JLT.2014.2317941 · 2.86 Impact Factor
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    • "The device is fabricated in a generic integration technology platform [13], [14] in which the design is based on certain standardized building blocks. In the generic integration platform, the wafer layer stack and fabrication process are optimized for best overall performance and are not tailored towards a specific application. "
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    ABSTRACT: We present the calibration method and characterization of a monolithically integrated semiconductor optical pulse shaper. The photonic integrated circuit has been realized in an InP-based generic photonic foundry process. In this circuit, a 20-channel arrayed waveguide grating filter with 50-GHz channel spacing and 20 phase modulators and semiconductor optical amplifiers are combined on the InP chip. By calibrating the device, a mathematical description of the pulse shaper is obtained. The theoretical procedure for complete calibration of the device is presented, and the details of the experiments and measurement setups are given. We demonstrate that the frequency response of the pulse shaper can be calculated from the response of the individual channels in a reference state of the control signals and a separate mask function that describes the effect of a change in the control signals.
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