A Generic Foundry Model for InP-based Photonic ICs

IET Optoelectronics (Impact Factor: 0.97). 11/2011; 5(5):187 - 194. DOI: 10.1049/iet-opt.2010.0068
Source: IEEE Xplore

ABSTRACT Similarities and differences between photonic and microelectronic integration technology are discussed and a vision of the development of InP-based photonic integration in the coming decade is given.

Download full-text


Available from: Norbert Grote, Jul 25, 2014
  • Source
    • "The second approach aims to develop a dual wavelength source that can be fabricated on a Generic InP-based technology platform to access the cost reduction of a multi-project wafer run. This approach, limited by the building blocks available on the platform [12], developed a dual wavelength arrayed waveguide grating (AWG) laser structure. These were initially proposed for wavelength division multiplexed sources since they are able to deliver multiple wavelengths, with fixed frequency spacing, defined by the AWG (usually Δλ ß 100 GHz). "
    [Show abstract] [Hide abstract]
    ABSTRACT: This paper describes the advantages that the introduction of photonic integration technologies can bring to the development of photonic-enabled wireless communications systems operating in the millimeter wave frequency range. We present two approaches for the development of dual wavelength sources for heterodyne-based millimeter wave generation realized using active/passive photonic integration technology. One approach integrates monolithically two distributed feedback semiconductor lasers along with semiconductor optical amplifiers, wavelength combiners, electro-optic modulators and broad bandwidth photodiodes. The other uses a generic photonic integration platform, developing narrow linewidth dual wavelength lasers based on arrayed waveguide gratings. Moreover, data transmission over a wireless link at a carrier wave frequency above 100 GHz is presented, in which the two lasers are free-running, and the modulation is directly applied to the single photonic chip without the requirement of any additional component.
    Journal of Lightwave Technology 10/2014; 32(20):3495-3501. DOI:10.1109/JLT.2014.2321573 · 2.86 Impact Factor
  • Source
    • "As constant improvements in the performance and fabrication yield of photonic integrated circuits is observed [12], there is enough evidence that monolithic photonic integration could offer advantages in terms of a significant reduction in the system footprint, inter-element coupling losses, packaging costs, and system power consumption thanks to the use of a single cooler for multiple functions. Moreover, advances and decreasing fabrication cost in photonic integration have been triggered by the recent availability of numerous generic fabrication platforms [13], thus simplifying the development of advanced integrated photonic systems. 0733-8724 © 2014 IEEE. "
    [Show abstract] [Hide abstract]
    ABSTRACT: We present a review of the critical design aspects of monolithically integrated optical phase lock loops (OPLLs). OPLL design procedures and OPLL parameters are discussed. A technique to evaluate the gain of the closed loop operating system is introduced and experimentally validated for the first time. A dual-OPLL system, when synchronised to an optical frequency comb generator without any prior filtering of the comb lines, allows generation of high spectral purity signals at any desired frequency from several GHz up to THz range. Heterodyne phase locking was achieved at a continuously tuneable offset frequency between 2 and 6 GHz. Thanks to the photonic integration, small dimensions, and custom-made electronics, the propagation delay in the loop was less than 1.8 ns, allowing good phase noise performance with OPLLs based on lasers with linewidths less than a few MHz. The system demonstrates the potential for photonic integration to be applied in various microwave photonics applications where narrow-bandwidth tuneable optical filters with amplification functionality are required.
    Journal of Lightwave Technology 10/2014; 32(20):3893-3900. DOI:10.1109/JLT.2014.2317941 · 2.86 Impact Factor
  • Source
    • "The device is fabricated in a generic integration technology platform [13], [14] in which the design is based on certain standardized building blocks. In the generic integration platform, the wafer layer stack and fabrication process are optimized for best overall performance and are not tailored towards a specific application. "
    [Show abstract] [Hide abstract]
    ABSTRACT: We present the calibration method and characterization of a monolithically integrated semiconductor optical pulse shaper. The photonic integrated circuit has been realized in an InP-based generic photonic foundry process. In this circuit, a 20-channel arrayed waveguide grating filter with 50-GHz channel spacing and 20 phase modulators and semiconductor optical amplifiers are combined on the InP chip. By calibrating the device, a mathematical description of the pulse shaper is obtained. The theoretical procedure for complete calibration of the device is presented, and the details of the experiments and measurement setups are given. We demonstrate that the frequency response of the pulse shaper can be calculated from the response of the individual channels in a reference state of the control signals and a separate mask function that describes the effect of a change in the control signals.
    IEEE Photonics Journal 12/2013; 5(6):6602317-6602317. DOI:10.1109/JPHOT.2013.2289945 · 2.33 Impact Factor
Show more