NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process. Chem Eng J

Department of Chemical Engineering, Kangwon National University, Hyoja 2-Dong, Chuncheon, Kangwon-Do 200-701, Republic of Korea
The Chemical Engineering Journal (Impact Factor: 4.32). 02/2010; 156(3):557-561. DOI: 10.1016/j.cej.2009.04.037


We analyzed the NO and SO2 removal in the non-thermal plasma discharge process combined with TiO2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO2 removal efficiencies obtained in non-thermal plasma–TiO2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO2 by photocatalysts. The NO and SO2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO2.

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    • "There is another technology developed recently for the purpose of simultaneous removal of SO 2 and NO. Nasonova et al. [10] exhibited a plasma chemical vapor deposition (PCVD) method using a non-thermal plasma reactor. In the reactor, glass beads coated with thin film TiO 2 by PCVD process were used as dielectric materials. "
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