A universal electron mobility model of strained Si MOSFETs based on variational wave functions
ABSTRACT A new model is proposed to describe the electron mobility enhancement in strained Si MOSFETs inversion layers using the variational wave functions in the triangular potential approximation. Phonon scattering and surface roughness scattering are included in this model and electron mobility enhancements due to the suppression of these two scatterings are accounted for, respectively. A process-dependent interface parameter is introduced to fit with various technologies. Results from the model show good agreement with experiments for different Ge mole fractions and for a wide range of vertical effective field and temperature. The model is very interesting for implementation in conventional device simulators.
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ABSTRACT: Photoluminescence spectroscopy is applied on tensely strained silicon on insulator layer in order to evaluate the temperature dependence of the indirect energy bandgap. The strained silicon indirect bandgap follows a similar behaviour to bulk silicon at high temperature (from 80 K up to 300 K) which was described from the Varshni [Physica 34, 149 (1967)] and Bose-Einstein equations. Nevertheless, at low temperature (from 9 K to 80 K), an unusual blueshift of the bandgap is evidenced. The latter can be modelled considering band-tail states of density of states which are related to the strain fluctuation.Applied Physics Letters 03/2012; 100(10). · 3.52 Impact Factor