Article
Interfacial behavior of randomly charged sulfonated polystyrene (PSS) at the air/water interface
Department of Nano Science and Technology, Sejong University, Seoul 143-747, Republic of Korea; Department of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea; Department of Chemistry and Program of Integrated Biotechnology, Sogang University, Seoul 121-742, Republic of Korea; Department of Polymer Science and Engineering, BK21 Education Center of Technology for Advanced Materials and Parts, Chosun University, Republic of Korea; Department of Materials Science and Engineering, Stony Brook University, Stony Brook, NY 11794, United States; National Institute of Standards and Technology, Gaithersburg, MD 20899, United States
Colloids and Surfaces A: Physicochemical and Engineering Aspects
DOI:10.1016/j.colsurfa.2007.04.095
pp.660-665
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Keywords
35% sulfonation
characteristic regimes
compression
dominant electrostatic interactions
electrostatic
hydrophobic interactions
hysteretic
irreversible films
Langmuir monolayers
polystyrene sulfonated acid
PSS
PSSx
ranges
reversible film
situ neutron reflectivity
sulfonation
various degrees
water subphase