Achieving High Curie Temperature in (Ga,Mn)As

Applied Physics Letters (Impact Factor: 3.52). 08/2008; DOI: 10.1063/1.2992200
Source: arXiv

ABSTRACT We study the effects of growth temperature, Ga:As ratio and post-growth annealing procedure on the Curie temperature, Tc, of (Ga,Mn)As layers grown by molecular beam epitaxy. We achieve the highest Tc values for growth temperatures very close to the 2D-3D phase boundary. The increase in Tc, due to the removal of interstitial Mn by post growth annealing, is counteracted by a second process which reduces Tc and which is more effective at higher annealing temperatures. Our results show that it is necessary to optimize the growth parameters and post growth annealing procedure to obtain the highest Tc.

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    ABSTRACT: The diluted (Ga,Mn)As became a model ferromagnetic semiconductor, however there is still a disagreement on the source of its magnetism. The divergences arise from the results indicating that the holes mediated ferromagnetism reside in the valence band or the impurity band. Full understanding of character of the Mn states in GaAs can bring the increase of (Ga,Mn)As Curie temperature. In this paper we verify the ellipsometric results and compare with more precise photoreflectance method which gives a new insight into the interactions of Mn impurity states with GaAs valence band. Indeed, E1 and E1+Δ1 inter-band transition energies for highly doped and annealed (Ga,Mn)As epitaxial layers have not confirmed the interaction between detached Mn impurity band and the valence band. Thus, the description with merged Mn states and GaAs valence band is in agreement with our results. Our findings are supported by the high resolution transmission microscopy and magnetization measurements.

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